The number of contaminating particles on a silicon wafer prior to a certain rins
ID: 2948661 • Letter: T
Question
The number of contaminating particles on a silicon wafer prior to a certain rinsing process was determined for each wafer in a sample of ze 100, resulting in the following frequencies: Number of particles Frequenc 0 2 3 45 678910 113 14 113 12 11 15 19 10 12521 (a) What propertion of the sampled walers had at least one particle? At least five particles? (Round your ansmers to tmo decimal places) at least five particles (b) What proportion of the sampled waers had between fve and ten partides, Inclusive? Strictly between five and ten partides (Round your answers to two decimal places between ive and ten particles, indlusive strictly between five and ten particles (c) Draw a histogram using relative frequency on the vertical anis o 12 34567 9 1011121314 0123456789 10111213 14 Percen Number Number o 1234387891011121314 01234567 9 1011121314 How would you desoribe the shape of the histogram? The histogram is positively skewed and bimodal The histogram is positively skewed and unimodal The histogram is negatively skewed and unimodal. The histogram is fairly symmetric and unimodal The histogram is negatively skewed and bimodal. The histogram is farty symmetric and bimodalExplanation / Answer
a)
P(at least one particle)=1-P(0 particle)=1-0.01=0.99
P(at least 5 particle)=1-P(at mst 4 particles)=1-(0.01+0.01+0.03+0.12+0.11)=0.72
b)
P(5<=X<=10)=0.65
P(5<X<10)=0.45
c)
bottom left curve is right
d)
the histogram is positively skewed unimodal
number frequency relative x f(x) P(x) 0 1 0.01 1 1 0.01 2 3 0.03 3 12 0.12 4 11 0.11 5 15 0.15 6 19 0.19 7 10 0.1 8 12 0.12 9 4 0.04 10 5 0.05 11 3 0.03 12 1 0.01 13 2 0.02 14 1 0.01 total 100Related Questions
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