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Thirty observations on the oxide thickness of individual silicon wafers are show

ID: 3182413 • Letter: T

Question

Thirty observations on the oxide thickness of individual silicon wafers are shown in Table 1.

a. Use these data to set up a control chart on oxide thickness and a moving range

chart. Does the process exhibit statistical control? Explain your answer.

Ans: X Control Chart MR Control Chart

63.9733 17.3940

49.8100 5.3200

35.6534 0.0000

Plot control charts and state conclusion

b. Estimate the mean and standard deviation of the oxide thickness of individual

silicon wafers.

Ans: 49.81 4.72

c. If the oxide thickness cannot exceed 65 units, what percentage of wafers will not

meet this specification?

Ans: 0.0647%

d. Following the establishment of the control charts in part (a), 10 new wafers were observed. The oxide thickness measurements are shown in Table 2. Plot these observations against the control limits determined in part (a). Is the process in control? Explain your answer.

Ans: Plot new observations in control charts and state conclusion Table 1

Final answer provided need written solution not Microsoft excel. Thanks

Ans: Plot new observations in control charts and state conclusion Table 1

Final answer provided need written solution not Microsoft excel. Thanks

Home Tools Sample Problems... X Table 1 Wafer Oxide Thickness Wafer Oxide Thickness 1 49.40 16 56.40 2 48.60 17 51.00 3 49.50 18 411.20 44 44.00 19 47.10 5 50.90 20 45.70 55.20 21 57.60 45.50 22 51.00 8 52.80 23 53.00 9 45.30 24 56.00 10 46.30 25 47.20 11 53.90 26 48.00 12 49.80 27 55.90 13 46.90 28 50.00 14 49.80 29 47 90 15 45.10 300 53.40 Table 2 Wafer Oxide Thickness 31 54.30 32 57.50 33 61.80 64.90 35 59.60 36 51.50 27 58.40 38 61.20 39 67.40 40 63.30 Sign In

Explanation / Answer

control limits for X Control Chart MR Control Chart are as follows

63.9733 17.3940

49.8100 5.3200

35.6534 0.0000

if 10 new wafers were observed. The oxide thickness measurements are shown in Table 2.

Plotting these observations against the control limits determined in part (a). then wafer number 34 and 39 these two points are out of UCL. hence given process is out of control.

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