45) (25) Provide a short series of fabrication steps similar to the way we went

Question

45) (25) Provide a short series of fabrication steps similar to the way we went through in class with regards to the CMOS device but for this simple MEMS thermally isolated structure. You don't have to worry about times, temperatures, dimensions, etc.. you just need to show a few 2D drawings showing a step-by-step process as to how you would fabricate this device. (i.e materials, lithographic steps, depositions, etches (etch type), etc) Please just assume the MEMS device is a block of gold Note: you can do this fabrication sequence in 3 images. MEMS Device SiO

Explanation / Answer

Over the past several decades MEMS researchers and developers have demonstrated an extremely large number of microsensors for almost every possible sensing modality including temperature, pressure, inertial forces, chemical species, magnetic fields, radiation, etc. Remarkably, many of these micromachined sensors have demonstrated performances exceeding those of their macroscale counterparts. That is, the micromachined version of, for example, a pressure transducer, usually outperforms a pressure sensor made using the most precise macroscale level machining techniques. Not only is the performance of MEMS devices exceptional, but their method of production leverages the same batch fabrication techniques used in the integrated circuit industry – which can translate into low per-device production costs, as well as many other benefits. Consequently, it is possible to not only achieve stellar device performance, but to do so at a relatively low cost level. Not surprisingly, silicon based discrete microsensors were quickly commercially exploited and the markets for these devices continue to grow at a rapid rate.

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