4. An interdigitated platinum electrode has been patterned on a silicon nitride
ID: 2248745 • Letter: 4
Question
4. An interdigitated platinum electrode has been patterned on a silicon nitride passivated silicon substrate, and the figure below shows top-down and cross-section view of the final device. Please design a process flow using the materials and equipments given below. (a) Draw cross-section and top-down images after each step of your processes. Also, (b) draw an optical mask layout for your photolithography process. You are only expected to draw top down view of your mask with indication of transparent and opaque area. Please make sure you have legend to clearly indicate your materials of different layers. - Silicon nitride passivated silicon wafer - Image reversal photoresist (AZ-5214E) and corresponding developer (AZ 400K) A set of equipment for photolithography (mask aligner, spinner, hot plate, developing bench, etc.) Sputtering machine with chrome and platinum Acetone, methanol, isopropyl-alcohol, and deionized water urce - Top-down view Silicon substrate Platinum Silicon nitride Chrome Cross-section view 5. From the problem 4, explain the function/purpose of the chrome layer undemeath the platinum.Explanation / Answer
Functions of chrome layer
The typical aplications of chrome layer while electrodepositing or electroplating are hydralics, mold making, vehicles, shafts and bearings.
The chrome layer acts as al lamination between the platinum and silicon nitride during electroplating by acting as the above mentioned functions.
this prosses is cost less whem compaired to other's like electroless, plasma spray coating, PVC/CVD etc..
This chrome layer hardness is measured 4 methods mainly they are, X-ray fluorescence, eddy current, beta backscatter, magnetic induction.
cost of these measuring methods will be in ascending order respectively.
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