The cross bridge test structure, consisting of a metal layer on an insulating su

Question

The cross bridge test structure, consisting of a metal layer on an insulating substrate, is used to measure the line width W. The structure is formed by depositing the metal and then chemical- mechanical polishing it to 200 nm. From scanning electron microscope measurements, W of this structure is typically 0.1 um. One day, the cross bridge measured W is 0.12 um. It is suspected that the “cross” region, is a thinner than the “line” region due to overpolishing. The "line” region metal thickness is not affected. What is the metal thickness (in nm) in the “cross” region in this case? p= 104 ohm-cm. Ooss 2 Line

Explanation / Answer

Given that,

Thickness = 13.6 X [ s.s + s.l - w.t ] w.t   X 10-4

     s.s = 200nm

    s.l = 0.1 Um

    w.t = 0.12 Um

    Thickness =[ 200 + 100 - 120 ] X 120

                     = 21600 nm

Related Questions

Navigate

• Browse (All)
• Browse T
• Subjects

---

---

Integrity-first tutoring: explanations and feedback only — we do not complete graded work. Learn more.