consider the 3 component etch solution curve for GaAs below A) what etch rate wo
ID: 105795 • Letter: C
Question
consider the 3 component etch solution curve for GaAs below
A) what etch rate would you expect for a solution that is equal part of H2O2, H2SO2 and H2O
B) for what solution do you expect the maximum etch rate? put an X on the chart to show it.
C) your etch process uses 10% H2O2 and 60% H2SO2 in water solution. what is the etch rate? if your dafety officer told you to minimize the acid content in your process solution without changing the process time/result. what solution would you test first?
GaAs Etching H202 1.0 2.0 3.0 3.3 3.5 3.3 3.0 2.0 3.3 A 1.5 1.0 0.5 1.5 Um 0.5 H20 H2S04Explanation / Answer
A)At a rate of nearly 3.3 all the parts of solution would be at equal rates and hence therefore there will be no difference in concentration of the solution. It is estimated as 3.3because all the parts of the solution remain in same position at this point or meet at this point.
B)The maximum etch rate would be approximately present at 3.5 as the individual concentrations are at the same place at this point.
C)At 10%of H2O2, the etch rate is =(3.5×10)/100=0.35
At 60% of H2SO2,the etch rate is=(3.5×60)/100=2.1
When the acid concentrations are changed,first the change in H2SO2 solution is checked as it involves the maximum etch rate.
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